Disilane is a chemical compound with general chemical formula Si2R6 that was first identified in 1902 by Henri Moissan and Samuel Smiles (1877–1953) where R = H. Moissan and Smiles reported disilane as being among the products formed by the action of dilute acids on metal silicides.Although these reactions had been previously investigated by Friedrich Woehler and Heinrich Buff between 1857 and 1858, Moissan and Smiles were the first to explicitly identify disilane.Other compounds of the general formula Si2X6 (X = hydrogen, halogen, alkyl, aryl, and mixtures of these groups) are called disilanes.The method has been abandoned for the production of silane, but it remains viable for generating disilane.[6] More generally, diorganosilanes are produced by reductive coupling of silyl chlorides, e.g. Disilane gas can be used to control pressure of Si vapors during process of graphene growth by thermal decomposition of SiC.